3 edition of Enhancement of thickness uniformity of thin films grown by pulsed laser deposition found in the catalog.
Enhancement of thickness uniformity of thin films grown by pulsed laser deposition
by National Aeronautics and Space Administration, National Technical Information Service, distributor in [Washington, D.C.?, Springfield, Va
Written in English
|Statement||Félix E. Fernández.|
|Series||NASA contractor report -- NASA CR-197791.|
|Contributions||United States. National Aeronautics and Space Administration.|
|The Physical Object|
Epitaxial yttrium iron garnet films grown by pulsed laser deposition P. C. Dorsey, S. E. Bushnell, R. G. Seed, and C. Vittoria Department of Electrical and Computer Engineering, Northeastern University, Boston, Massachusetts (Received 28 October ; accepted for publication 17 March )Cited by: Pulsed laser deposition (PLD) is a thin film growth technique that differs from conventional deposition techniques, such as thermal evaporation, in at least two essential ways: the depositing species arrive in short bursts of μs; and the depositing species have kinetic energy eV, compared with.
Pulsed laser deposition of ni thin films on metallic su bstrate (density and smooth surface of the material) [9,10] but may be depending on the plasma plume particles charge type and velocity, too. The ablation of smaller droplets originating from the fast heating and cooling processes of the target. Pulsed laser deposition of thin films / edited by Douglas B. Chrisey and Graham K. Hubler, New York, Wiley, •PLD and S are the most appropriate techniques for deposition of complex oxides. •PLD reproduces target stoichiometry in an oxidizing ambient.
We report a study on the biocompatibility vs. thickness in the case of titanium nitride (TiN) films synthesized on medical grade stainless steel substrates by pulsed laser deposition. The films were grown in a nitrogen atmosphere, and their in vitro cytotoxicity was assessed according to ISO . Extensive physical-chemical analyses have been carried out on the deposited structures Cited by: 5. Pulsed Laser Deposition of DLC Effect of Wavelength and Fluence Effect of Substrate Temperature and Vacuum Modifications to the Pulsed Laser Deposition Technique Growth of DLC Films Reducing Internal Compressive Stress in DLC Thin Films
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Get this from a library. Enhancement of thickness uniformity of thin films grown by pulsed laser deposition. [Félix E Fernández; United States. National Aeronautics and Space Administration.]. Pulsed laser ablation is a well-known technique used for thin film deposition of a variety of thin films for various applications.
The diversity of thin films grown by this technique is extensive, though most of the films have been deposited using excimer lasers. – However, a major disadvantage of the use of excimer lasers has been the.
Apr 01, · Alternate pulsed laser deposition from the host (Al 2 O 3) and dopant (Er, Yb) targets has been used to prepare artificially nanostructured films in which the rare earth ion–ion separation is controlled in the nanometer scale in order to control energy transfer between ogmaexpo.com series of films was prepared in the standard on-axis configuration, i.e.
a static substrate being centred with Cited by: 6. properties of ZnO ﬁlms grown by PLD,16) However, there has been no report on the eﬀect of ﬁlm thickness on properties of ZnO grown by PLD.
In this paper, we report on the eﬀect of the thickness variation on the surface morphology and structural, elec-trical, and optical properties of ZnO thin ﬁlms grown on c-plane sapphire by PLD. • types of thin film synthesis • pulsed laser ablation • example: the grain boundary problem in YBaCuO.
kV, Amp, 3 phase • pulsed laser deposition • CVD (chemical vapour deposition) • electrochemical • sol-gel What do PLD grown films look like. FESEM image of 7o YBa 2Cu3O7 HRTEM image of 10o YBa 2Cu3O7. Highly crystalline thin films of MoS2 were prepared over large area by pulsed laser deposition down to a single monolayer on Al2O3 (), GaN (), and SiC-6H () substrates.
Pulsed laser deposition (PLD) has emerged as a relatively simple and highly versatile technique for the growth of thin films of variety of materials1. Deposition of epitaxial, stoichiometric thin films of simple materials2 or multi-element complex compounds on suitable substrates3, multilayers4, nano-particles5 and nano-structures etc.
are. ITO thin films deposited by advanced pulsed laser deposition Article in Thin Solid Films (24) · October with Reads How we measure 'reads'. Epitaxial LaNiO 3 (LNO) thin films on LaAlO 3 (LAO), SrTiO 3 (STO), and YSZ are grown by pulsed laser deposition method at mTorr oxygen partial pressure and °C substrate temperature.
As‐deposited LNO films are metallic down to 10 K. c‐axis oriented YBa 2 Cu 3 O 7 (YBCO) films were grown on LNO/LAO as well as LNO/STO surfaces without affecting superconducting transition temperature Cited by: phase-change thin films grown by pulsed laser deposition Xinxing Sun 1, Erik Thelander, Jürgen W Gerlach, to investigate the crystallization kinetics of GeTe films grown by pulsed laser deposition.
In this paper, nanosecond-PLD is used as a deposition tech- film thickness of 60nm at a deposition rate of ~30 −nm min 1.
Analysis of Zirconia Thin Films Grown by Pulsed Laser Deposition V. Cancea1,ogmaexpo.coma2,ogmaexpo.com2, M. Filipescu2, M. Dinescu2 1Department of Physics, University of CraiovaRomania 2Department of Lasers, National Institute for Laser, Plasma and Radiation Physics, Magurele, Romania Abstract Zirconia thin ﬁlms have been grown on silicon () substrates masked or not.
Pulsed Laser Deposition of Thin Films by G.K. Hubler,available at Book Depository with free delivery worldwide.
Abstract. The principle of thin film deposition by laser ablation, a droplet problem, basic schemes for laser deposition of smooth thin films, creation of multilayer structures with YBaCuO, ferroelectric films and metals are ogmaexpo.com by: Pulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique where a high-power pulsed laser beam is focused inside a vacuum chamber to strike a target of the material that is to be deposited.
This material is vaporized from the target (in a plasma plume) which deposits it as a thin film on a substrate (such as a silicon wafer facing the target). An examination of the latest materials and applications in pulsed laser deposition.
Following up on the book Pulsed Laser Deposition of Thin Films, this current version summarizes the state of the technology in pulsed laser deposition (PLD) techniques, new Format: Hardcover. Indian Journal of Pure & Applied Physics Vol.
48, Aprilpp. Structural and magnetic behaviour of NiFe 2O4 thin film grown by pulsed laser deposition Gagan Dixit*, J P Singh*, R C Srivastava*, H M Agrawal*, R J Choudhary** & Ajay Gupta**Cited by: 1. Abstract. High energy product Nd 2 Fe 14 B films were grown onto Si() substrate by a KrF pulsed laser ablation using the targets of Nd x Fe x B (x=~).
The films of the Nd 2 Fe 14 B single phase did not exhibit a preferred orientation. However, ,  and  axes were prominent for the films grown at the substrate temperature above °C by using the target of Cited by: Simple and inexpensive methods of obtaining large‐area uniform in thickness and composition thin films on rotating substrates and moving ribbons through pulsed laser deposition have been proposed.
Thin films of different compositions were prepared using these methods. The thickness uniformity of obtained films was preserved within the limits of ±3% on up to mm diameter substrates. Also Author: Armen S. Kuzanyan, Astghik A. Kuzanyan. Abstract Highly crystalline thin films of MoS 2 were prepared over large area by pulsed laser deposition down to a single monolayer on Al 2 O 3 (), GaN (), and SiC-6H () substrates.
X-ray diffraction and selected area electron diffraction studies show that the films are quasi-epitaxial with good out-of-plane texture. Synthesis of Novel Thin-Film Materials by Pulsed Laser Deposition Douglas H. Lowndes, D.
Geohegan, A. Puretzky, D. Norton, C. Rouleau Pulsed laser deposition (PLD) is a conceptually and experimentally simple yet highly versatile tool for thin-film and multilayer research. Its advantages for the film growth of. CHAPTER 3 PULSED LASER DEPOSITION OF OXIDES Introduction films can be grown in a reactive oxygen background gas without the need for further processing.
This chapter is mainly based on Chrisey and Hubler’s book on ”Pulsed Laser Deposition of Thin Films.Pulsed Laser Deposition Growth of Heusler Half-Metallic Thin Films A thesis submitted in partial fulfilment of the requirements for the Degree of Master of Science in Physics in the University of Canterbury by Chrissy Emeny University of Canterbury Mar 30, · Read "Enhanced field emission from LaB 6 thin films with nanoprotrusions grown by pulsed laser deposition on Zr foil, Applied Surface Science" on DeepDyve, the largest online rental service for scholarly research with thousands of academic publications available at your fingertips.